Process Monitoring
Unique single particle optical sizing (SPOS) technology, allows users to individually size and count particles over a wide range with unprecedented accuracy AccuSizer® SPOS systems available in LE, FX, and FX-Nano configurations to meet the unique needs of your CMP slurry characteristics Nicomp® N3000 online system can be integrated into many nanoparticle processes, providing real-time particle size distributions.
Reference to the Particle Characterization Applications page for additional information.
Process Monitoring Systems Applications:
- Detecting oversized particles in chemical mechanical planarization (CMP) slurries
- Nanoparticle online analysis